Effects of oxygen on the properties of sputtered molybdenum thin films

Japanese Journal of Applied Physics

Volumn 30, Issue 9, 1991, Pages 2069-2073

  Yamaguchi, Tetsuya ^a   Miyagawa, Ryohei ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Effect of oxygen in molybdenum; Film stress; Film structure; Magnetron sputtering; Migration

Indexed keywords

METALLIC FILMS--MICROSTRUCTURE; MOLYBDENUM AND ALLOYS--THIN FILMS; OXYGEN; STRESSES; X-RAY ANALYSIS;

TENSILE STRESS;

MOLYBDENUM AND ALLOYS;

EID: 0026226631     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.30.2069     Document Type: Article

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