Synthesis and electrochemical properties of Ti doped LiCoO2 thin film cathodes

Journal of Alloys and Compounds

Volumn 491, Issue 1-2, 2010, Pages 503-506

  Rao, M C ^a   Hussain, O M ^b  

^a ANDHRA LOYOLA COLLEGE   (India)

^b SRI VENKATESWARA UNIVERSITY   (India)

Author keywords

AFM; Electrochemical properties; PLD films; Ti doped LiCoO2; XRD

Indexed keywords

ACTIVE AREA; AFM; CRYSTALLINITIES; DEPOSITION CHAMBERS; ELECTROCHEMICAL MEASUREMENTS; FILM FORMATIONS; LITHIUM METAL FOIL; OXYGEN PARTIAL PRESSURE; PREPARATION CONDITIONS; PULSED-LASER DEPOSITION TECHNIQUE; SILICON SUBSTRATES; SPECIFIC CAPACITIES; SUBSTRATE TEMPERATURE; SWEEP RATES; THIN FILM CATHODES; TI DOPED; XRD;

ATOMIC FORCE MICROSCOPY; CRYSTAL ATOMIC STRUCTURE; CYCLIC VOLTAMMETRY; DEPOSITION; DOPING (ADDITIVES); FILM PREPARATION; METAL FOIL; MORPHOLOGY; OXYGEN; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER DEPOSITION; PULSED LASERS; SUBSTRATES; THIN FILMS; TITANIUM; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ELECTROCHEMICAL PROPERTIES;

EID: 74449090859     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.10.246     Document Type: Article

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