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Volumn 436, Issue 1-2, 2007, Pages 303-308

The film growth and electrochemical properties of rf-sputtered LiCoO2 thin films

Author keywords

GITT; HT LiCoO2; Li+ diffusion coefficient; Rf sputtering; SSCV; Thin film cathode

Indexed keywords

ANNEALING; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL PROPERTIES; FILM GROWTH; LITHIUM ALLOYS; MAGNETRON SPUTTERING; SILICON;

EID: 34047253418     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2006.07.033     Document Type: Article
Times cited : (42)

References (27)
  • 13
    • 34047248836 scopus 로고
    • Chapman B. (Ed), John Wiley & Sons Inc., NY (Chapters 1-2)
    • In: Chapman B. (Ed). Glow Discharge Processes (1980), John Wiley & Sons Inc., NY 2-48 (Chapters 1-2)
    • (1980) Glow Discharge Processes , pp. 2-48


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.