Studies on the target conditioning for deposition of LiCoO2 films

Vacuum

Volumn 83, Issue 6, 2009, Pages 1001-1006

  Nimisha, C S ^a   Ganapathi, M ^a   Munichandraiah, N ^a   Mohan Rao, G ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

LiCoO2 thin film; RF magnetron sputtering; Target conditioning; X ray photoelectron spectroscopy

Indexed keywords

COBALT; ELECTRIC DISCHARGES; ELECTRODEPOSITION; ELECTRON SPECTROSCOPY; ELECTRONS; EMISSION SPECTROSCOPY; FIELD EMISSION; LITHIUM; LITHIUM COMPOUNDS; MAGNETRONS; OXIDE FILMS; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTOIONIZATION; PHOTONS; REAL TIME SYSTEMS; SCANNING ELECTRON MICROSCOPY; SOLIDS; SPECTRUM ANALYSIS; SYSTEM STABILITY; TARGETS; THIN FILM DEVICES; THIN FILMS; TRANSITION METALS;

DEPOSITION KINETICS; DISCHARGE CAPACITIES; LICOO2 THIN FILM; RF-MAGNETRON SPUTTERING; STEADY STATES; SURFACE COMPOSITIONS; TARGET CONDITIONING; TARGET SURFACES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 58749109417     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.12.002     Document Type: Article

References (16)

1. Bouwman P.J., Boukampa B.A., Bouwmeestera H.J.M., and Notten P.H.L. Solid State Ionics 152-153 (2002) 181-188
2. Park H.Y., Lee S.R., Lee Y.J., Cho B.W., and Cho W.I. Materials Chemistry and Physics 93 (2005) 70-78
3. Pracharová J., Pridal J., Bludská J., Jakubec I., Vorlíček V., Málková Z., et al. Journal of Power Sources 108 (2002) 204-212
4. Polo da Fonseca C.N., Davalos J., Kleinke M., Fantini M.C.A., and Gorenstein A. Journal of Power Sources 81-82 (1999) 575-580
5. Wang B., Bates J.B., Hart F.X., Sales B.C., Zuhr R.A., and Robertson J.D. Journal of the Electrochemical Society 143 (1996) 3203-3213
6. Muralidhar G.K., Mohan Rao G., Ghanashyam Krishna M., Narasimha Rao K., Menon A.G., Balasubramanian T.V., et al. Vacuum 44 (1993) 1049-1052
7. Rossen E., Reimers J.N., and Dahn J.R. Solid State Ionics 62 (1993) 53-60
8. Kim W.-S. Journal of Power Sources 134 (2004) 103-109
9. Dedryvère R., Laruelle S., Grugeon S., Poizot P., Gonbeau D., and Tarascon J.-M. Chemistry of Materials 16 (2004) 1056-1061
10. Dupin J.C., Gonbeau D., Benqlilou-Moudden H., Vinatier Ph., and Levasseur A. Thin Solid Films 384 (2001) 23-32
11. 2surface phases investigated by photoelectron spectroscopy. Appl. Surf. Sci. 255 (2008) 2517-2523
12. Powell G.L., Clusing R.E., and McGuire G.E. Surface Science 49 (1975) 310-314
13. JCPDS - International Center for Diffraction Data (No. 44-0145).
14. Jeon S.-W., Lim J.-K., Lim S.-H., and Lee S.-M. Electrochimica Acta 51 (2005) 268-273
15. Reimers J.N., and Dahn J.R. Journal of the Electrochemical Society 139 (1992) 2091
16. Bates J.B., Dudney N.J., Neudecker B.J., Hart F.X., Jun H.P., and Hackney S.A. Journal of the Electrochemical Society 147 1 (2000) 59-70