Effects of annealing time on infrared emissivity of the Pt film grown on Ni alloy

Applied Surface Science

Volumn 256, Issue 7, 2010, Pages 2025-2030

  Huang, Zhibin ^a   Zhou, Wancheng ^a   Tang, Xiufeng ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

Annealing time; Low emissivity layer; Platinum film; Sputter deposited

Indexed keywords

ANNEALING; CHEMICAL ANALYSIS; ELECTROMAGNETIC WAVE EMISSION; METALLIC FILMS; NICKEL ALLOYS;

ANNEALING TIME; DC ELECTRICAL RESISTIVITIES; INFRARED EMISSIVITY; LOW EMISSIVITIES; NI BASED ALLOY; NICKEL ALLOY SUBSTRATES; PLATINUM FILMS; PLATINUM THIN FILM;

THIN FILMS;

EID: 74149086962     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.09.042     Document Type: Article

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