Thick optical waveguides in lithium niobate induced by swift heavy ions (∼10 MeV/amu) at ultralow fluences

Optics Express

Volumn 17, Issue 26, 2009, Pages 24175-24182

  Olivares, José ^a,b   Crespillo, Miguel L ^b   Caballero Calero, Olga ^b,c   Ynsa, María D ^b   García Cabañes, Angel ^d   Toulemonde, Marcel ^e   Trautmann, Christina ^f   Agulló López, Fernando ^b  

^a INSTITUTO DE ÓPTICA   (Spain)

^b CENTRO DE MICROANÁLISIS DE MATERIALES   (Spain)

^c LABORATOIRE D ASTROPHYSIQUE   (France)

^d UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

^e Direction de la Recherche Fondamentale   (France)

^f GSI HELMHOLTZZENTRUM FÜR SCHWERIONENFORSCHUNG GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; KRYPTON; LIGHT REFRACTION; LITHIUM; NIOBIUM COMPOUNDS; NONLINEAR OPTICS; OPTICAL WAVEGUIDES; REFRACTIVE INDEX; REFRACTOMETERS; THICKNESS MEASUREMENT; WAVEGUIDES; XENON;

CONSISTENT VALUES; DIELECTRIC MEDIUM; ELECTRONIC EXCITATION; FLUENCES; IMPLANTATION TECHNIQUE; INDEX PROFILE; ION ENERGIES; ION-INDUCED DAMAGE; LIGHT IONS; LITHIUM NIOBATE; LOW LOSS; MEV ENERGY; MIDINFRARED; NONLINEAR OPTICAL RESPONSE; PARTIAL AMORPHIZATION; PLANAR OPTICAL WAVEGUIDES; REFRACTIVE INDEX CHANGES; SWIFT HEAVY IONS;

IONS;

HEAVY ION; LITHIUM NIOBATE; NIOBIUM; OXIDE;

ARTICLE; CHEMISTRY; COMPUTER AIDED DESIGN; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; LIGHT; MATERIALS TESTING; OPTICAL INSTRUMENTATION; RADIATION EXPOSURE; RADIATION SCATTERING; REFRACTOMETRY;

COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; HEAVY IONS; LIGHT; MATERIALS TESTING; NIOBIUM; OPTICAL DEVICES; OXIDES; REFRACTOMETRY; SCATTERING, RADIATION;

EID: 73949149947     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.024175     Document Type: Conference Paper

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