Investigation of stress induced by CO2 laser processing of fused silica optics for laser damage growth mitigation

Optics Express

Volumn 17, Issue 26, 2009, Pages 23488-23501

  Gallais, Laurent ^a   Cormont, Philippe ^b   Rullier, Jean Luc ^b  

^a CNRS   (France)

^b CEA CESTA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

LASER DAMAGE; OXIDES; PULSED LASER APPLICATIONS; RESIDUAL STRESSES; SILICA; STRESS CONCENTRATION;

BEAM SIZE; DAMAGE AREA; ENERGY DEPOSITIONS; FUSED SILICA OPTICS; INCIDENT POWER; LASER DAMAGE GROWTH; LASER DAMAGE RESISTANCE; LASER ENERGY ABSORPTION; LASER INTERACTION; LASER PROCESSING; NANOSECOND LASERS; NUMERICAL MODELS; PHOTOELASTIC METHOD; PULSE DURATIONS; QUANTITATIVE VALUES; STRESS DISTRIBUTION; STRESS FIELD; STRESS LEVELS; STRESS-INDUCED; THERMALLY INDUCED STRESS;

FUSED SILICA;

SILICON DIOXIDE;

ARTICLE; CHEMISTRY; LASER; MECHANICAL STRESS; RADIATION DOSE; RADIATION EXPOSURE; RADIATION RESPONSE; SURFACE PROPERTY;

DOSE-RESPONSE RELATIONSHIP, RADIATION; LASERS, GAS; RADIATION DOSAGE; SILICON DIOXIDE; STRESS, MECHANICAL; SURFACE PROPERTIES;

EID: 73949089998     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.023488     Document Type: Article

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