Cyclic nanoindentation of semiconductor and metal thin films

International Journal of Modern Physics B

Volumn 23, Issue 30, 2009, Pages 5639-5647

  Fang, Te Hua ^a   Chang, Win Jin ^b   Lin, Chao Ming ^c   Chang, Chun Chin ^a  

^a NATIONAL FORMOSA UNIVERSITY   (Taiwan)

^b KUN SHAN UNIVERSITY   (Taiwan)

^c WUFENG INSTITUTE OF TECHNOLOGY   (Taiwan)

Author keywords

Cyclic nanoindentation; Hardness; Low frequency fatigue; Young's modulus

Indexed keywords

EID: 73249116351     PISSN: 02179792     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0217979209053643     Document Type: Article

References (22)

1. N. R. Moody, W. W. Gerberich, N. Burnham and S. P. Baker, Fundamentals of Nanoindentation and Nanotribology (Materials Research Society, Warrendale, PA, 1998).
2. B. Bhushan, Principles and Applications of Tribology (Wiley, New York, 1999).
3. W. C. Oliver and G. M. Pharr, J. Mater. Res. 7, 1564 (1992).
4. M. Qing and D. Clarke, J. Mater. Res. 10, 853 (1995).
5. W. Nix and H. Gao, J. Mech. Phys. Solids 46, 411 (1998).
6. N. Tymiak, D. Kramer, D. Brhr, T. Wyrobek and W. Gerberich, Acta Mater. 49, 1021 (2001).
7. T. Chudoba and F. Richter, Surf. Coat. Tech. 148, 191 (2001).
8. T. H. Fang and W. J. Chang, Microelec. Eng. 65, 231 (2003).
9. X. Li, H. Gao, C. J. Murphy and K. K. Caswell, Nano Lett. 3, 1495 (2003).
10. T. H. Fang, W. J. Chang and S. L. Tsai, Microelectr. J. 36, 55 (2005).
11. C. Tsou, C. Hsu and W. Fang, Sensor Actuat. A 117, 309 (2005).
12. K. J. Hemker and W. N. Sharpe Jr., Annu. Rev. Mater. Res. 37, 93 (2007).
13. L. I. Chang and L. C. Zhang, Int. J. Mod. Phys. B 22, 6022 (2008).
14. K. J. Van Vliet and S. Suresh, Philoso. Mag. A 82, 1993 (2002).
15. X. Li and B. Bhushan, Surf. Coat. Tech. 163-164, 521 (2003).
16. J. M. Cairney, R. Tsukano, M. J. Ho man and M. Yang, Acta Mate. 52, 3229 (2004).
17. I. N. Sneddon, Int. J. Engin. Sci. 3, 47 (1965).
18. Q. Ma and D. R. Clarke, J. Mater. Res. 10, 853 (1995).
19. T. H. Fang and W. J. Chang, J. Phys. Chem. Solids 64, 913 (2003).
20. Y. G. Gogotsi, V. Domnich, S. N. Dub, A. Kailer and K. G. Nickel, J. Mater. Res. 15, 871 (2000).
21. G. M. Pharr and W. C. Oliver, J. Mater. Res. 17, 2660 (2002).
22. S. R. Jian, T. H. Fang and D. S. Chuu, J. Electron. Mater. 32, 496 (2003).