SCOPUS 정보 검색 플랫폼

Applied Physics Express

Volumn 2, Issue 12, 2009, Pages

405 nm Laser thermal lithography of 40 nm pattern using super resolution organic resist material

(6) Usami, Yoshihisa a Watanabe, Tetsuya a Kanazawa, Yoshinori a Taga, Kazuaki a Kawai, Hiroshi a Ichikawa, Kimio a

a FUJIFILM CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION METHOD; GASIFICATION TEMPERATURES; HIGH RESOLUTION RESISTS; LASER SPOTS; LASER THERMAL; ORGANIC RESIST; RESIST MATERIALS; SUPER RESOLUTION; TEMPERATURE PROFILES;

DRY ETCHING; ORGANIC LASERS; PLASMA ETCHING; SEMICONDUCTOR QUANTUM DOTS; SILICON COMPOUNDS;

LITHOGRAPHY;

EID: 73149113333 PISSN: 18820778 EISSN: 18820786 Source Type: Journal
DOI: 10.1143/APEX.2.126502 Document Type: Article

Times cited : (30)

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