Hyperthermal atomic hydrogen and oxygen etching of vertically oriented graphene sheets

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2413-2419

  Bagge Hansen, M ^a   Outlaw, R A ^a   Zhu, M Y ^a   Chen, H J ^a   Manos, D M ^a  

^a Dept of Economics and Thomas Jefferson Program in Public Policy at the College of William and Mary   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC HYDROGEN; BEFORE AND AFTER; CARBON NANOSHEETS; CO-PRODUCTION; CROSS SECTION; DEFECT SITES; ELECTRON STIMULATED DESORPTION; ETCHING RATE; GRAPHENE SHEETS; HIGH CURRENT FIELD EMISSION; HIGH CURRENTS; IN-LINE; LIFETIME TESTING; OXYGEN ETCHING; OXYGEN SPECIES; POTENTIAL APPLICATIONS; REACTION PRODUCTS; RF PLASMA; SIMULTANEOUS ACQUISITION; ULTRAHIGH VACUUM SYSTEM;

DESORPTION; ELECTRODES; ETCHING; FIELD EMISSION; GRAPHITE; HYDROGEN; MASS SPECTROMETERS; MASS SPECTROMETRY; NANOSHEETS; OXYGEN; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; VACUUM;

FIELD EMISSION CATHODES;

EID: 72849145315     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3263245     Document Type: Conference Paper

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