Image processing using shape recognition for alignment to damaged registration marks in electron beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2563-2568

  Kratschmer, E ^a   Klaus, D P ^a   Viswanathan, R ^a   Turnidge, M L ^b   Reed, P L ^b   McPhail, B ^b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b Vistec Lithography   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEMENTARY METAL-OXIDE SEMICONDUCTOR DEVICES; CRITICAL EXPOSURE; E-BEAM LITHOGRAPHY; FIN FIELD-EFFECT TRANSISTORS; HARDWARE AND SOFTWARE; IMAGE PROCESSING TECHNIQUE; KAWASAKI; PROCESS STEPS; REGISTRATION SYSTEMS; SHAPE RECOGNITION; STATIC RANDOM ACCESS MEMORY;

ALIGNMENT; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; IMAGE PROCESSING; IMAGING SYSTEMS; METALLIC COMPOUNDS; MOS DEVICES; RANDOM ACCESS STORAGE; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES;

FIELD EFFECT TRANSISTORS;

EID: 72849126932     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3237099     Document Type: Conference Paper

References (10)

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