High-performance MgO thin films for PDPs with a high-rate sputtering-deposition process

Journal of the Society for Information Display

Volumn 16, Issue 12, 2008, Pages 1195-1201

  Terauchi, Masaharu ^a   Hashimoto, Jun ^a   Nishitani, Hikaru ^a   Fukui, Yusuke ^a   Okafuji, Michiko ^a   Yamashita, Hitoshi ^a   Hayata, Hiroshi ^a   Okuma, Takafumi ^a   Yamanishi, Hitoshi ^a   Nishitani, Mikihiko ^a   Kitagawa, Masatoshi ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

Chemical stability; CL PDP; Good discharge characteristics; High density; High rate; Hot cathode; Impurity doping; Mgo; Sputtering

Indexed keywords

DISCHARGE CHARACTERISTICS; HIGH DENSITY; HIGH RATE; HOT CATHODE; HOT CATHODES; IMPURITY DOPING;

CHEMICAL MODIFICATION; CHEMICAL STABILITY; SEMICONDUCTOR DOPING; STOICHIOMETRY; THIN FILMS;

DEPOSITION;

EID: 72249104147     PISSN: 10710922     EISSN: None     Source Type: Journal    
DOI: 10.1889/JSID16.12.1195     Document Type: Conference Paper

References (13)

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