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Journal of Chemical Physics

Volumn 131, Issue 16, 2009, Pages

Site-specific behavior in de-excitation spectra of F3SiCH 2CH2Si(CH3)3 in the Si 1s excitation region

(7) Suzuki, I H a Nitta, A b Fukuzawa, H c Ueda, K c Takahashi, O d Tamenori, Y e Nagaoka, S b

a INSTITUTE OF MATERIALS STRUCTURE SCIENCE (Japan)

b EHIME UNIVERSITY (Japan)

c TOHOKU UNIVERSITY (Japan)

d HIROSHIMA UNIVERSITY (Japan)

e JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ENVIRONMENT; DE-EXCITATIONS; EXCITATION REGION; EXCITED ELECTRONS; PHOTON ENERGY; RESONANT AUGER DECAY; RESONANT PHOTOEMISSION; RYDBERG ELECTRON; RYDBERG ORBITALS; SITE-SPECIFIC; SPECTATOR-AUGER; THEORETICAL CALCULATIONS; TOTAL ION YIELDS; TRIMETHYL; UNDULATOR RADIATION; VACANT ORBITALS; VALENCE ELECTRON; VALENCE ORBITALS;

AUGERS; DENSITY FUNCTIONAL THEORY; ELECTRONS; EMISSION SPECTROSCOPY; MOLECULAR ORBITALS; PHOTOEXCITATION; SILICON;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 72049086719 PISSN: 00219606 EISSN: None Source Type: Journal
DOI: 10.1063/1.3257639 Document Type: Article

Times cited : (10)

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