Site-specific fragmentation caused by Si:1s core-level photoionization of F3SiCH2CH2Si(CH3)3 vapor

Chemical Physics Letters

Volumn 412, Issue 4-6, 2005, Pages 459-463

  Nagaoka, S ^a   Tamenori, Y ^b   Hino, M ^a   Kakiuchi, T ^a   Ohshita, J ^c   Okada, K ^c   Ibuki, T ^d   Suzuki, I H ^e  

^a EHIME UNIVERSITY   (Japan)

^b JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^c HIROSHIMA UNIVERSITY   (Japan)

^d KYOTO UNIVERSITY OF EDUCATION   (Japan)

^e NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; KINETIC ENERGY; MONOCHROMATORS; PHOTONS; SILICON; SYNCHROTRON RADIATION;

CORE-LEVEL; IONIC FRAGMENTATION; PEAK HEIGHT; PHOTOELECTRONS;

PHOTOIONIZATION;

EID: 24044496988     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2005.07.044     Document Type: Article

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