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International Journal of Mass Spectrometry

Volumn 247, Issue 1-3, 2005, Pages 101-105

Site-specific fragmentation caused by core-level photoexcitation: Comparison between Si:1s and 2p photoexcitations in F3SiCH 2CH2Si(CH3)3 vapor

(9) Nagaoka, Shin Ichi a Tamura, Asuka a Fujii, Akiko a Ohshita, Joji b Okada, Kazumasa b Ibuki, Toshio c Suzuki, Isao H d Ohashi, Haruhiko e Tamenori, Yusuke e

a EHIME UNIVERSITY (Japan)

b HIROSHIMA UNIVERSITY (Japan)

c KYOTO UNIVERSITY OF EDUCATION (Japan)

d NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

e JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE (Japan)

Author keywords

Core level photoexcitation; Organosilicon molecule; Site specific fragmentation; Synchrotron radiation

Indexed keywords

EID: 28544453275 PISSN: 13873806 EISSN: None Source Type: Journal
DOI: 10.1016/j.ijms.2005.10.003 Document Type: Article

Times cited : (9)

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