Surface morphology and light scattering properties of plasma etched ZnO:B films grown by LP-MOCVD for silicon thin film solar cells

Thin Solid Films

Volumn 518, Issue 4, 2009, Pages 1026-1031

  Addonizio, M L ^a   Antonaia, A ^a  

^a ENEA   (Italy)

Author keywords

Light scattering; LP MOCVD; Plasma etching; Zinc oxide

Indexed keywords

A-SI:H; AFM IMAGE; ANGULAR SCATTERING; ARGON PLASMA PROCESS; DECONVOLUTION APPROACH; ETCHING TIME; HIGH QUALITY; LAYER INTERFACES; LP-MOCVD; MOCVD; PREFERENTIAL SCATTERING; SCATTERED LIGHT; SCATTERING PROPERTY; SCATTERING SURFACE; SEM; SHARP EDGES; SILICON THIN FILM; TEXTURE CHARACTERISTICS; ZNO;

ANGULAR DISTRIBUTION; ARGON; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; LIGHT SCATTERING; MORPHOLOGY; PLASMA ETCHING; PLASMAS; REFRACTION; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SILICON; SOLAR CELLS; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; THIN FILMS; ZINC; ZINC OXIDE;

SCATTERING;

EID: 71949128397     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.07.200     Document Type: Article

References (21)

1. Meier J., Spitznagel J., Kroll U., Bucher C., Fay S., Moriarty T., and Shah A. Thin Solid Films 451-452 (2004) 518
2. Bohmer E., Siebke F., Rech B., Beneking C., and Wagner H. Mater. Res. Soc. Symp. Proc. 420 (1996) 519
3. Sakai H., and Ichikawa Y. J. Non-Cryst. Solids 137&138 (1991) 1155
4. Nuruddin A., and Abelson J.R. Thin Solid Films 394 (2001) 49
5. Kubon M., Boehmer E., Siebke F., Rech B., Beneking C., and Wagner H. Sol. Energy Mater. Sol. Cells 41/42 (1996) 485
6. Ganguly G., Carlson D.E., Hegedus S.S., Ryan D., Gordon R.G., Pang D., and Reedy R.C. Appl. Phys. Lett. 85 3 (2004) 479
7. Wenas WilsonW., De A., Yamada A., Konagai M., and Takahashi K. Sol. Energy Mater. Sol. Cells 34 (1994) 313
8. Bailat J., Dominè D., Schluchter R., Steinhauser J., Fay S., Freitas F., Bucher C., Feitknecht L., Niquille X., Tschamer T., Shah A., and Ballif C. Proceedings of the Fourth WCPEC Conference, Hawaii (2006) 1533
9. Python M., Vallat-Sauvain E., Bailat J., Dominé D., Fesquet L., Shah A., and Ballif C. J. Non-Cryst. Solids 354 (2008) 19
10. Addonizio M.L., Manoj R., and Usatii I. Proceedings of 22nd EPVSEC Milan-Italy (2007) 2129
11. Leblanc F., Perrin J., and Schmitt J. J. Appl. Phys. 75 (1994) 1074
12. Tao G., Zeman M., and Metselaar J.W. Sol. Energy Mater. Sol. Cells 34 (1994) 359
13. Krc J., Zeman M., Kluth O., Smole F., and Topic M. Thin Solid Films 426 (2003) 296
14. Addonizio M.L., Diletto C., and Antonaia A. Proceedings of 23rd EPVSEC Valencia-Spain (2008) 2313
15. Addonizio M.L., and Diletto C. Sol. Energy Mater. Sol. Cells 92 (2008) 1448
16. Addonizio M.L., and Antony A. Proceedings 21st EPVSEC Dresden-Germany (2006) 1688
17. Oehrein GottliebS. Surf. Sci. 386 (1997) 222
18. Bennet J.M., and Mattsson L. Introduction to Surface Roughness and Scattering (1999), Optical Society of America, Washington, D.C.
19. Schade H., and Smith Z.E. Appl. Opt. 24 (1985) 3221
20. Lechner P., Geyer R., Schade H., Rech B., Kluth O., and Stiebig H. Proceedings 19th EPVSEC Paris-France (2004) 1591
21. Sakai H., Yoshida T., Hama T., and Ichikawa Y. Jpn. J. Appl. Phys. 29 4 (1990) 630