Interface fracture properties of thin films studied by using the micro-cantilever deflection technique

Surface and Coatings Technology

Volumn 204, Issue 6-7, 2009, Pages 878-881

  Matoy, Kurt ^a,b,c   Detzel, Thomas ^d   Müller, Matthias ^d   Motz, Christian ^b   Dehm, Gerhard ^b,c  

^a Kompetenzzentrum Automobil und Industrie Elektronik Gmbh   (Austria)

^b ERICH SCHMID INSTITUTE OF MATERIALS SCIENCE   (Austria)

^c UNIVERSITY OF LEOBEN   (Austria)

^d INFINEON TECHNOLOGIES AUSTRIA AG   (Austria)

Author keywords

Interface toughness; Ion beam processing; Micro cantilever

Indexed keywords

ALTERNATIVE APPROACH; CANTILEVER DEFLECTION; CRITICAL ENERGY RELEASE RATE; HIGH SPATIAL RESOLUTION; INTERFACE FRACTURE; INTERFACE TOUGHNESS; ION BEAM PROCESSING; MECHANICAL BEHAVIOR; METALLIC THIN FILMS; MICRO-CANTILEVERS; THIN FILM SYSTEMS;

ATOMIC FORCE MICROSCOPY; ION BEAMS; METALLIC COMPOUNDS; NANOCANTILEVERS; OXIDE FILMS; SILICON OXIDES; THIN FILMS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 71849089365     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.09.013     Document Type: Article

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