Effect of platinum and ruthenium incorporation on voltammetric behavior of nitrogen doped diamond-like carbon thin films

Electroanalysis

Volumn 21, Issue 23, 2009, Pages 2590-2596

  Khun, N W ^a   Liu, E ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Cyclic voltammetry; Magnetron sputtering; N DLC and PtRuN DLC thin films; Thin films; Voltammetry

Indexed keywords

CARBON FILMS; CATALYST ACTIVITY; CHLORINE COMPOUNDS; CONDUCTIVE FILMS; CYCLIC VOLTAMMETRY; DIAMOND LIKE CARBON FILMS; DIAMONDS; ELECTRODES; MAGNETRON SPUTTERING; NITROGEN; PLATINUM; POTASSIUM; POTASSIUM COMPOUNDS; RUTHENIUM; SEMICONDUCTOR DOPING;

DIAMOND-LIKE CARBON THIN FILMS; DLC FILM; DLC THIN FILMS; FILM ELECTRODES; MAGNETRON-SPUTTERING; N-DLC AND PTRUN-DLC THIN FILM; NITROGEN DOPED DIAMOND-LIKE CARBON; POTENTIAL WINDOWS; THIN-FILMS; VOLTAMMETRIC BEHAVIORS;

THIN FILMS;

EID: 71649087087     PISSN: 10400397     EISSN: 15214109     Source Type: Journal    
DOI: 10.1002/elan.200900250     Document Type: Article

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