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Volumn 1173, Issue , 2009, Pages 145-148

X-ray microscopy for interconnect characterization

Author keywords

High resolution; Interconnect; Packaging; Semiconductor; TSV (Through Silicon Via); X ray imaging

Indexed keywords


EID: 70450277450     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.3251210     Document Type: Conference Paper
Times cited : (4)

References (6)
  • 5
    • 21744452342 scopus 로고    scopus 로고
    • Soft X-ray microscopy at a spatial resolution better than 15 nm
    • 30 June
    • W. Chao, B. D. Harteneck, J. A. Liddle, E. H. Anderson, and D. T. Attwood, "Soft X-ray microscopy at a spatial resolution better than 15 nm," Nature 435, 1210-1213 (30 June 2005).
    • (2005) Nature , vol.435 , pp. 1210-1213
    • Chao, W.1    Harteneck, B.D.2    Liddle, J.A.3    Anderson, E.H.4    Attwood, D.T.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.