Combined continuous wave and pulsed plasma modes: For more stable interfaces with higher functionality on metal and semiconductor surfaces

Plasma Processes and Polymers

Volumn 6, Issue 10, 2009, Pages 615-619

  Li, Li ^a,b,c   Dai, Xiujuan J ^a,h   Xu, Hong S ^a,d   Zhao, Jing H ^a,e   Yang, Ping ^a,f   Maurdev, George ^a   Plessis, Johan Du ^g   Lamb, Peter R ^h   Fox, Bronwyn L ^h   Michalski, Wojtek P ^a  

^a CSIRO   (Australia)

^b CIVIL AVIATION UNIVERSITY OF CHINA   (China)

^c INSTITUTE OF PHYSICS   (China)

^d SICHUAN UNIVERSITY   (China)

^e JILIN UNIVERSITY   (China)

^f DONGHUA UNIVERSITY   (China)

^g RMIT UNIVERSITY   (Australia)

^h DEAKIN UNIVERSITY   (Australia)

Author keywords

Heptylamine; Polymerization; Primary amines; Pulsed plasmas; Surface modification

Indexed keywords

AQUEOUS SOLUTIONS; BIOINTERFACES; CONTINUOUS MODE; CONTINUOUS WAVE; CONTINUOUS WAVES; NEW DESIGN; PRIMARY AMINES; PULSED MODE; PULSED PLASMA; PULSED PLASMA POLYMERIZATION; PULSED PLASMAS; SEMI-CONDUCTOR SURFACES; SURFACE MODIFICATION;

AMINATION; FLUORINE CONTAINING POLYMERS; FUNCTIONAL GROUPS; PLASMA POLYMERIZATION; PLASMAS; POLYMERS; SURFACE TREATMENT;

AMINES;

EID: 70450215283     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200900042     Document Type: Article

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