Polymer underlayer assisted dewetting of a top metal nanofilm

Nanotechnology

Volumn 20, Issue 47, 2009, Pages

  Abeysinghe, Don C ^a   Chen, Weibin ^c   Zhan, Qiwen ^c   Nelson, Robert E ^b  

^a 705 Engineering Research Center   (United States)

^b AIR FORCE RESEARCH LABORATORY   (United States)

^c UNIVERSITY OF DAYTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AU NANOPARTICLE; DE-WETTING; HETEROGENEOUS NUCLEATION; ION DOSE; NANO FILMS; OPTOELECTRONIC APPLICATIONS; PATTERN PERIOD; PATTERN PERIODICITY; PMMA FILMS; POSITIONAL ACCURACY; RASTER SCANNING; SHARP BOUNDARIES; SOLID SUBSTRATES; UNDERLAYERS; UNIFORM PMMA;

FOCUSED ION BEAMS; IONS;

GOLD;

GALLIUM; GOLD; METAL; NANOFILM; POLY(METHYL METHACRYLATE); POLYMER;

ARTICLE; DEVICE; ELECTRONICS; OPTICS; PRIORITY JOURNAL; RADIATION BEAM; WETTABILITY;

EID: 70449753425     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/47/475301     Document Type: Article

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