-
1
-
-
21644443347
-
Highly Scalable Non-volatile Resistive Memory using Simple Binary Oxide Driven by Asymmetric Unipolar Voltage Pulses
-
I. G. Baek, M. S. Lee, S. Seo, M. J. Lee, D. H. Seo, D. -S. Suh, J. C. Park, S. O. Park, H. S. Kim, I. K. Yoo, U-In Chung and J. T. Moon, "Highly Scalable Non-volatile Resistive Memory using Simple Binary Oxide Driven by Asymmetric Unipolar Voltage Pulses," IEDM Tech. Dig. , pp. 587-590, 2004
-
(2004)
IEDM Tech. Dig
, pp. 587-590
-
-
Baek, I.G.1
Lee, M.S.2
Seo, S.3
Lee, M.J.4
Seo, D.H.5
Suh, D.-S.6
Park, J.C.7
Park, S.O.8
Kim, H.S.9
Yoo, I.K.10
Chung, U.-I.11
Moon, J.T.12
-
2
-
-
46049114175
-
Multi-layer cross-point binary oxide resistive memory (OxRRAM) for post-NAND storage application
-
I. G. Baek, D. C. Kim, M. J. Lee, H. -J. Kim, E. K. Yim, M. S. Lee, J. E. Lee, S. E. Ahn, S. Seo, J. H. Lee, J. C. Park, Y. K. Cha, S. O.Park, H. S. Kim, I. K. Yoo, U-In. Chung, J. T. Moon, and B. I. Ryu, "Multi-layer cross-point binary oxide resistive memory (OxRRAM) for post-NAND storage application," IEDM Tech. Dig., pp. 769-762, 2005,
-
(2005)
IEDM Tech. Dig
, pp. 769-762
-
-
Baek, I.G.1
Kim, D.C.2
Lee, M.J.3
Kim, H.-J.4
Yim, E.K.5
Lee, M.S.6
Lee, J.E.7
Ahn, S.E.8
Seo, S.9
Lee, J.H.10
Park, J.C.11
Cha, Y.K.12
Park, S.O.13
Kim, H.S.14
Yoo, I.K.15
Chung, U.-I.16
Moon, J.T.17
Ryu, B.I.18
-
3
-
-
50249134847
-
Fast switching and long retention Fe-O ReRAM and its switching mechanism
-
S. Muraoka, K. Osano, Y. Kanazawa, S. Mitani, S. Fujii, K. Kaytayama, Y. Katoh, Z. Wei, T. Mikawa, K. Arita, Y. Kawashima, R. Azuma, K. Kawai, K. Shimakawa, A. Odagawa, and T. Takagi, "Fast switching and long retention Fe-O ReRAM and its switching mechanism," IEDM Tech. Dig. , pp. 779-782 , 2007
-
(2007)
IEDM Tech. Dig
, pp. 779-782
-
-
Muraoka, S.1
Osano, K.2
Kanazawa, Y.3
Mitani, S.4
Fujii, S.5
Kaytayama, K.6
Katoh, Y.7
Wei, Z.8
Mikawa, T.9
Arita, K.10
Kawashima, Y.11
Azuma, R.12
Kawai, K.13
Shimakawa, K.14
Odagawa, A.15
Takagi, T.16
-
4
-
-
68249128656
-
Highly Reliable TaOx ReRAM and Direct Evidence of Redox Reaction Mechanism
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Z. Wei, Y. kanzawa, K. Arita, Y. Katoh, K. Kawai, S. Muraoka, S. Mitani, S. Fujii, K. Katayama, M. iijima, T. Mikawa, T. Ninomiya, R. Miyanaga, Y. Kawashima, K. Tsuji, A. himeno, T. Okada, R. Azuma, K. Shimakawa, H. Sugaya, T. Takagi, R. Yasuhara, K Horiba, H. Kumigashira, and M. Oshima, "Highly Reliable TaOx ReRAM and Direct Evidence of Redox Reaction Mechanism," IEDM Tech. Dig. , pp. 293-196 , 2008
-
(2008)
IEDM Tech. Dig
, pp. 293-196
-
-
Wei, Z.1
kanzawa, Y.2
Arita, K.3
Katoh, Y.4
Kawai, K.5
Muraoka, S.6
Mitani, S.7
Fujii, S.8
Katayama, K.9
iijima, M.10
Mikawa, T.11
Ninomiya, T.12
Miyanaga, R.13
Kawashima, Y.14
Tsuji, K.15
himeno, A.16
Okada, T.17
Azuma, R.18
Shimakawa, K.19
Sugaya, H.20
Takagi, T.21
Yasuhara, R.22
Horiba, K.23
Kumigashira, H.24
Oshima, M.25
more..
-
5
-
-
50249156872
-
Low Power and High Speed Switching of Ti-doped NiO ReRAM under the Unipolar Voltage Source of less than 3V
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K. Tsunoda, K. Kinoshita, H. Noshiro, H. Noshiro, Y. Yamazaki, T. Iizuka, Y. Ito, A. Takahashi, A. Okano, Y. Sato, T. Fukano, M. Aoki, and Y. Sugiyama, "Low Power and High Speed Switching of Ti-doped NiO ReRAM under the Unipolar Voltage Source of less than 3V," IEDM Tech. Dig. , pp. 767-770 , 2007
-
(2007)
IEDM Tech. Dig
, pp. 767-770
-
-
Tsunoda, K.1
Kinoshita, K.2
Noshiro, H.3
Noshiro, H.4
Yamazaki, Y.5
Iizuka, T.6
Ito, Y.7
Takahashi, A.8
Okano, A.9
Sato, Y.10
Fukano, T.11
Aoki, M.12
Sugiyama, Y.13
-
6
-
-
34547838883
-
Lowering the Switching Current of Resistance Random Access Memory Using a Hetero Junction Structure Consisting of Transition Metal Oxides
-
K. Kinoshita, T. Tamura, M. Aoki, Y. Sugiyama and H. Tanaka, "Lowering the Switching Current of Resistance Random Access Memory Using a Hetero Junction Structure Consisting of Transition Metal Oxides", Jpn. J. Appl. Phys. , Vol. 45, No. 37, L991-994, 2006
-
(2006)
Jpn. J. Appl. Phys
, vol.45
, Issue.37
-
-
Kinoshita, K.1
Tamura, T.2
Aoki, M.3
Sugiyama, Y.4
Tanaka, H.5
-
7
-
-
33748513895
-
-
K. Kinoshita, T. Tamura, M. Aoki, Y. Sugiyama and H. Tanaka, Bias polarity dependent data retention of resistive random access memory consisting of binary transition metal oxide, Apl. Phys. Lett., 89, APL. 89, pp. 103509-103511, 2006
-
K. Kinoshita, T. Tamura, M. Aoki, Y. Sugiyama and H. Tanaka, "Bias polarity dependent data retention of resistive random access memory consisting of binary transition metal oxide," Apl. Phys. Lett., Vol. 89, APL. Vol. 89, pp. 103509-103511, 2006
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