Creating an affordable 22nm node using design-lithography co-optimization

Proceedings - Design Automation Conference

Volumn , Issue , 2009, Pages 95-96

  Strojwas, A J ^a,b   Jhaveri, T ^a,b   Rovner, V ^a,b   Pileggi, L ^a,b  

^a PDF SOLUTIONS INC   (United States)

^b CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

Design technology co optimization; DFM; Regular fabric; Templates

Indexed keywords

EID: 70350736225     PISSN: 0738100X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/1629911.1629941     Document Type: Conference Paper

References (3)

1. T. Jhaveri, A.J. Strojwas, L. Pileggi, V. Rover, "Enabling Technology Scaling with In Production Lithography Processes", Proc. SPIE, Vol. 6924 (2008).
2. L. Liebmann et al, "Simplify to Survive, Prescriptive Layouts Ensure Profitable Scaling to 32nm and Beyond", Proc. SPIE, Vol. 7275 (2009).
3. A.J. Strojwas, "Taking the next step in Moore's Law: Designs turn to enable next technology node", IEDM (2008).