Inverted hemispherical mask colloidal lithography

Nanotechnology

Volumn 20, Issue 46, 2009, Pages

  Xu, Haixia ^a   Rao, Wenyuan ^a   Meng, Jun ^a   Shen, Yang ^a   Jin, Chongjun ^a   Wang, Xuehua ^a  

^a SUN YAT SEN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COLLOIDAL LITHOGRAPHY; CURVED SURFACES; DISK ARRAY; LIFT-OFF PROCESS; NANO-FABRICATION METHODS; OPTICAL DIFFRACTIONS; OPTICAL MEASUREMENT; OXYGEN PLASMA ETCHING; PERIODIC ARRAYS; POLYACRYLIC ACIDS; POLYSTYRENE FILMS; SACRIFICIAL LAYER; TWO-DIMENSIONAL METALS; TWO-DIMENSIONAL NANOSTRUCTURES; WATER SOLUTIONS;

DISKS (STRUCTURAL COMPONENTS); METAL RECOVERY; METAMATERIALS; NANOSTRUCTURES; OPTICAL DATA PROCESSING; ORGANIC ACIDS; OXYGEN; PLASMA ETCHING; POLYSTYRENES; SURFACE PLASMON RESONANCE;

TWO DIMENSIONAL;

NANOMATERIAL; OXYGEN; POLYACRYLIC ACID; POLYSTYRENE; WATER;

ARTICLE; COST EFFECTIVENESS ANALYSIS; FILM; MASK COLLOIDAL LITHOGRAPHY; NANOFABRICATION; NANOTECHNOLOGY; PRIORITY JOURNAL; SURFACE PLASMON RESONANCE; SURFACE PROPERTY;

EID: 70350647300     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/46/465608     Document Type: Article

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