Synthesis and characterization of photosensitive benzocyclobutene- functionalized siloxane thermosets

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 47, Issue 22, 2009, Pages 6246-6258

  Zuo, Xiaobiao ^a   Yu, Ruilian ^a   Shi, Song ^a   Feng, Zhihai ^a   Li, Zhongping ^a   Yang, Shiyong ^b   Fan, Lin ^b  

^a AEROSPACE RESEARCH INSTITUTE OF MATERIALS AND PROCESSING TECHNOLOGY   (China)

^b INSTITUTE OF CHEMISTRY   (China)

Author keywords

Benzocyclobutene; Dielectric properties; Diels Alder polymers; High performance polymers; methylphenylsiloxane oligomers; Photopolymerization; Photosensitive; Water absorptions

Indexed keywords

BENZOCYCLOBUTENE; CROSS-LINKABLE; CURING PROCESS; CYCLOHEXANONES; DIELS-ALDER POLYMERS; DISILOXANE; DISSIPATION FACTORS; FUNCTIONALIZED; HIGH MOLECULAR WEIGHT; HIGH PERFORMANCE POLYMERS METHYLPHENYLSILOXANE OLIGOMERS; LOW DIELECTRIC CONSTANTS; LOW WATER; METHYLCYCLOHEXANONE; METHYLPHENYLSILOXANE; NEGATIVE IMAGE; PATTERN DEFORMATION; PHOTOSENSITIVE; PHOTOSENSITIVE AGENTS; PRINTING MODES; SYNTHESIS AND CHARACTERIZATION; TERMINAL POSITION; THERMAL STABILITY;

BUTENES; CERAMIC CAPACITORS; CURING; DIELECTRIC PROPERTIES; MONOMERS; OLIGOMERS; PHOTOPOLYMERIZATION; PHOTOSENSITIVITY; POLYMERS; RESINS; THERMOSETS;

LIGHT SENSITIVE MATERIALS;

EID: 70350645473     PISSN: 0887624X     EISSN: 10990518     Source Type: Journal    
DOI: 10.1002/pola.23668     Document Type: Article

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