Fabrication of 70 nm-sized zero residual polymer patterns by thermal nanoimprint lithography

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 7, 2009, Pages 4194-4196

  Yang, Ki Yeon ^a   Kim, Jong Woo ^a   Byeon, Kyeong Jae ^a   Lee, Hee Chul ^b   Lee, Heon ^a  

^a Korea University   (South Korea)

^b LG Electronics Inc   (South Korea)

Author keywords

Lift off; Metal pattern; Nanoimprint lithography; Zero residual layer

Indexed keywords

CRITICAL DIMENSION; HIGH ASPECT RATIO; IMPRINTING PROCESS; LIFT-OFF PROCESS; METAL NANOWIRE; METAL PATTERN; NANO-SIZED; OXYGEN PLASMAS; POLYMER PATTERNS; REMOVAL PROCESS; RESIDUAL LAYERS; RESIDUAL POLYMERS; SI WAFER; THERMAL NANOIMPRINT LITHOGRAPHY; THIN POLYMERS; TOP-DOWN PROCESS; ZERO RESIDUAL LAYER;

ASPECT RATIO; CHROMIUM; ELECTRIC WIRE; METAL RECOVERY; OXYGEN; POLYMERS; RESINS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

NANOIMPRINT LITHOGRAPHY;

EID: 70350333582     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2009.M30     Document Type: Conference Paper

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