Design of a new self-etching HEMA-free adhesive

Dental Materials Journal

Volumn 28, Issue 5, 2009, Pages 558-564

  Ikemura, Kunio ^a   Ichizawa, Kensuke ^a   Endo, Takeshi ^b  

^a Shofu Inc   (Japan)

^b KINKI UNIVERSITY   (Japan)

Author keywords

HEMA free adhesive; pH value; Self etching adhesive

Indexed keywords

2 HYDROXYETHYL METHACRYLATE; 4 ACRYLOYLOXYETHYLTRIMELLITIC ACID; 4-ACRYLOYLOXYETHYLTRIMELLITIC ACID; 6 METHACRYLOYLOXYHEXYL PHOSPHONOACETATE; 6-METHACRYLOYLOXYHEXYL PHOSPHONOACETATE; ACRYLIC ACID DERIVATIVE; BISPHENOL A BIS(2 HYDROXYPROPYL) ETHER DIMETHACRYLATE; DRUG DERIVATIVE; METHACRYLIC ACID DERIVATIVE; PHOSPHONOACETIC ACID; TOOTH CEMENT; TRICARBOXYLIC ACID;

ANALYSIS OF VARIANCE; ANIMAL; ARTICLE; CATTLE; CHEMISTRY; COMPARATIVE STUDY; DENTAL ACID ETCHING; DENTAL CARE; DENTAL SURGERY; DENTIN; DRUG COMBINATION; DRUG EFFECT; DRUG STORAGE; ENAMEL; INCISOR; METHODOLOGY; PH; SHEAR STRENGTH; TIME; ULTRASTRUCTURE;

ACID ETCHING, DENTAL; ACRYLATES; ANALYSIS OF VARIANCE; ANIMALS; BISPHENOL A-GLYCIDYL METHACRYLATE; CATTLE; DENTAL CEMENTS; DENTAL ENAMEL; DENTAL RESTORATION FAILURE; DENTAL STRESS ANALYSIS; DENTIN; DRUG COMBINATIONS; DRUG STORAGE; HYDROGEN-ION CONCENTRATION; INCISOR; METHACRYLATES; PHOSPHONOACETIC ACID; SHEAR STRENGTH; TIME FACTORS; TRICARBOXYLIC ACIDS;

EID: 70350228339     PISSN: 02874547     EISSN: None     Source Type: Journal    
DOI: 10.4012/dmj.28.558     Document Type: Article

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