메뉴 건너뛰기




Volumn , Issue , 2009, Pages 2165-2168

Effect of mobile ionic-charge on CMOS based Ion-Sensitive Field-Effect Transistors (ISFETs)

Author keywords

Chemical sensor; CMOS; Drift; ISFET; Mobile ionic charge; Threshold variation; Trapped charge

Indexed keywords

CMOS; DRIFT; ISFET; MOBILE IONIC CHARGE; THRESHOLD VARIATION; TRAPPED CHARGE;

EID: 70350173928     PISSN: 02714310     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISCAS.2009.5118225     Document Type: Conference Paper
Times cited : (7)

References (11)
  • 2
    • 0014698380 scopus 로고
    • Development of an ion-sensitive solid-state device for neurophysiological measurements
    • Jan
    • P. Bergveld, "Development of an ion-sensitive solid-state device for neurophysiological measurements," IEEE Transactions on Biomedical Engineering, vol. 17, pp. 70-71, Jan 1970.
    • (1970) IEEE Transactions on Biomedical Engineering , vol.17 , pp. 70-71
    • Bergveld, P.1
  • 3
    • 0033533260 scopus 로고    scopus 로고
    • Ion-sensitive field-effect transistors fabricated in a commercial cmos technology
    • J. Bausells, J. Carrabina, A. Errachid, and A. Merlos, "Ion-sensitive field-effect transistors fabricated in a commercial cmos technology," Sensors and Actuators B: Chemical, vol. 57, no. 1-3, pp. 56-62, 1999.
    • (1999) Sensors and Actuators B: Chemical , vol.57 , Issue.1-3 , pp. 56-62
    • Bausells, J.1    Carrabina, J.2    Errachid, A.3    Merlos, A.4
  • 4
    • 0034148960 scopus 로고    scopus 로고
    • Drift behavior of ISFETs with a-Si: H-SiO2 gate insulator
    • J. Chou and C. Hsiao, "Drift behavior of ISFETs with a-Si: H-SiO2 gate insulator," Materials Chemistry & Physics, vol. 63, no. 3, pp. 270-273, 2000.
    • (2000) Materials Chemistry & Physics , vol.63 , Issue.3 , pp. 270-273
    • Chou, J.1    Hsiao, C.2
  • 5
    • 84886361962 scopus 로고
    • Standardized terminology for oxide charge associated with thermally oxidized silicon
    • B. E. Deal, "Standardized terminology for oxide charge associated with thermally oxidized silicon," Transactions on Electron Devices IEEE, vol. ED-27, p. 606, 1980.
    • (1980) Transactions on Electron Devices IEEE , vol.ED-27 , pp. 606
    • Deal, B.E.1
  • 7
    • 0041728808 scopus 로고    scopus 로고
    • Substrate loss mechanisms for microstrip and cpw transmission lines on lossy silicon wafers
    • June
    • D. Lederer and J. P. Raskin, "Substrate loss mechanisms for microstrip and cpw transmission lines on lossy silicon wafers," Solid State Electronics, vol. 47, pp. 1927-1936, June 2003.
    • (2003) Solid State Electronics , vol.47 , pp. 1927-1936
    • Lederer, D.1    Raskin, J.P.2
  • 10
    • 41949116783 scopus 로고    scopus 로고
    • Matching the transconductance characteristics of cmos isfet arrays by removing trapped charge
    • Apr
    • M. J. Milgrew and D. R. S. Cumming, "Matching the transconductance characteristics of cmos isfet arrays by removing trapped charge," Transactions on Electron Devices IEEE, vol. 55, pp. 1074-1079, Apr 2008.
    • (2008) Transactions on Electron Devices IEEE , vol.55 , pp. 1074-1079
    • Milgrew, M.J.1    Cumming, D.R.S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.