Release properties and durability of release layer on UV nanoimprint lithography

Journal of Photopolymer Science and Technology

Volumn 22, Issue 2, 2009, Pages 175-180

  Taniguchi, Jun ^a   Yasuhiro, Kamiya ^a   Takeshi, Ohsaki ^a   Sakai, Nobuji ^b  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b TOYO GOSEI CO LTD   (Japan)

Author keywords

Durability; Nanoimprint; Photo curable resin; Release agent

Indexed keywords

EID: 70350139131     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.175     Document Type: Article

References (3)

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2. N. Unno, J. Taniguchi, and Y. Ishii, J. Vac. Sci. Technol. B 25 (2007), 2361.
3. J. Taniguchi, Y. Nemoto, and Y. Sugiyama, J. Nanosci. Nanothechnol., 9 (2009) 445.