Silicon-based dielectrics

Interlayer Dielectrics for Semiconductor Technologies

Volumn , Issue , 2003, Pages 121-156

  Leung, C ^a   Ong, E ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBIDES; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DIELECTRIC FILMS; DIELECTRIC MATERIALS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON; VAPOR DEPOSITION;

DEPOSITION TECHNIQUE; FILM PROPERTIES; FRONT-END DEVICES; MECHANICAL AND ELECTRICAL PROPERTIES; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR FABRICATION PROCESS; SEMICONDUCTOR INDUSTRY; SILICON SUBSTRATES;

SEMICONDUCTING SILICON;

EID: 70350128375     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1016/B978-012511221-5/50007-6     Document Type: Chapter

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