Te-Ge-Ga thin films deposited by co-thermal evaporation

Optoelectronics and Advanced Materials, Rapid Communications

Volumn 3, Issue 3, 2009, Pages 260-264

  Frayret, J ^a   Barthelemy E ^a   Albert, S ^a   Vigreux, C ^a   Pradel, A ^a  

^a UNIVERSITÉ DE MONTPELLIER   (France)

Author keywords

Co thermal evaporation; Te Ge Ga; Telluride films; Thin films

Indexed keywords

ADHESIVES; ENERGY GAP; GALLIUM COMPOUNDS; GERMANIUM COMPOUNDS; REFRACTIVE INDEX; TELLURIUM COMPOUNDS; THERMAL EVAPORATION;

AMORPHOUS REGIONS; BULK MATERIALS; CO-THERMAL EVAPORATION; CURRENT-INDUCED HEATING; ELECTRON BEAM BOMBARDMENT; EVAPORATED FILMS; TRANSMISSION SPECTRUMS;

THIN FILMS;

EID: 70350004014     PISSN: 18426573     EISSN: 20653824     Source Type: Journal    
DOI: None     Document Type: Article

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