Thin layers obtained by Plasma Process for Emerging Non-Volatile Memory (RRAM) applications

2009 IEEE International Memory Workshop, IMW '09

Volumn , Issue , 2009, Pages

  Souchier, E ^a   Cario, L ^a   Corraze, B ^a   Estournes C ^b   Fernandez, V ^a   Skotnicki, T ^c   Mazoyer, P ^c   Janod, E ^a   Besland, M P ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b INSTITUT CARNOT CIRIMAT   (France)

^c STMICROELECTRONICS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 70349983649     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMW.2009.5090608     Document Type: Conference Paper

References (5)

1. R. Waser, M. Aono, Nature Materials 6, 833 (2007).
2. C. Vaju, L. Cario, B. Corraze, E. Janod, V. Dubost, T. Cren, D. Roditchev, D. Braithwaite, O. Chauvet, Advanced Materials, 20, 2760-2765 (2008).
3. L. Cario, B. Corraze, E. Janod, C. Vaju, M.P. Besland, PCT Int. Appl.PCT/EP2008/052968 (2008).
4. PNF2 National Platform ; http://pnf2.dr14.cnrs.fr
5. M.P.Besland et al., Journal of Integrated Ferroelectrics 94, 94-104 (2007).