Enhanced field emission from Argon plasma-treated ultra-sharp α-Fe 2O 3 nanoflakes

Nanoscale Research Letters

Volumn 4, Issue 9, 2009, Pages 1115-1119

  Zheng, Z ^a   Liao, L ^a   Yan, B ^a   Zhang, J X ^b   Gong, Hao ^b   Shen, Z X ^a   Yu, T ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Field emission; Metal oxide; Plasma treated

Indexed keywords

AMORPHOUS COATING; ARGON PLASMAS; ENHANCED FIELD EMISSION; FIELD-EMISSION PROPERTIES; METAL OXIDE; NANOFLAKES; PLASMA TREATMENT;

ARGON; FIELD EMISSION; IRON ORES; METALLIC COMPOUNDS; OXIDE MINERALS; PLASMA APPLICATIONS; TRANSMISSION ELECTRON MICROSCOPY;

PLASMAS;

EID: 70349983504     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1007/s11671-009-9363-1     Document Type: Article

References (23)

1. Y. Xia, P. Yang, Y. Sun, Y. Wu, B. Mayers, B. Gates, Y. Yin, F. Kim, H. Yan, Adv. Mater. 15, 353 (2003). doi:10.1002/adma.200390087.
2. Y. Khlifi, K. Kassmi, L. Roubi, R. Maimouni, M.J. Condens. Matter. 3, 53 (2000).
3. C.X. Xu, X.W. Sun, B.J. Chen, Appl. Phys. Lett. 84, 1540 (2004). doi:10.1063/1.1651328.
4. Y.W. Zhu, A.M. Moo, T. Yu, X.J. Xu, X.Y. Gao, Y.J. Liu, C.T. Lim, Z.X. Shen, C.K. Ong, A.T.S. Wee, J.T.L. Thong, C.H. Sow, Chem. Phys. Lett. 419, 458 (2006). doi:10.1016/j.cplett.2005.11.087.
5. Y.W. Zhu, F.C. Cheong, T. Yu, X.J. Xu, C.T. Lim, J.T.L. Thong, Z.X. Shen, C.K. Ong, Y.J. Liu, A.T.S. Wee, C.H. Sow, Carbon 43, 395 (2005). doi:10.1016/j.carbon.2004.09.029.
6. W.Y. Sung, W.J. Kim, S.M. Lee, H.Y. Lee, Y.H. Kim, K.H. Park, S. Lee, Vacuum 81, 851 (2007). doi:10.1016/j.vacuum.2006.10.002.
7. J.W. Lee, H.N. Cho, S.R. Min, C.W. Chung, Integr. Ferroelectr. 90, 95 (2007). doi:10.1080/10584580701249371.
8. S. Mathur, R. Ganesan, I. Grobelsek, H. Shen, T. Ruegamer, S. Barth, Adv. Eng. Mater. 9, 658 (2007). doi:10.1002/adem.200700086.
9. S.C. Kung, K.C. Hwang, I.N. Lin, Appl. Phys. Lett. 80, 4819 (2002). doi:10.1063/1.1485315.
10. K. Yu, Z. Zhu, M. Xu, Q. Li, W. Lu, Chem. Phys. Lett. 373, 109 (2003). doi:10.1016/S0009-2614(03)00541-4.
11. J.S. Han, T. Bredow, D.E. Davey, A.B. Yu, D.E. Mulcahy, Sens. Actuators B 75, 18 (2001). doi:10.1016/S0925-4005(00)00688-2.
12. S.N. Frank, A.J. Bard, J. Phys. Chem. 81, 1484 (1977). doi:10.1021/j100530a011.
13. M.V. Reddy, T. Yu, C.H. Sow, Z.X. Shen, C.T. Lim, G.V. Subba Rao, B.V.R. Chowdari, Adv. Funct. Mater. 17, 2792 (2007). doi:10.1002/adfm.200601186.
14. X.Y. Liu, X.B. Ding, Z.H. Zheng, Y.X. Peng, A.S.C. Chan, C.W. Yip, X.P. Long, Polym. Int. 52, 235 (2003). doi:10.1002/pi.1031.
15. Y.W. Zhu, T. Yu, A.T.S. Wee, X. J. Xu, C.T. Lim, J.T.L. Thong, C.H. Sow, Appl. Phys. Lett. 87, 023103 (2005). doi:10.1063/1.1991978.
16. Z. Zheng, Y.Z. Chen, Z.X. Shen, J. Ma, C.H. Sow, W. Huang, T. Yu, Appl. Phys. A 89, 115 (2007). doi:10.1007/s00339-007-4180-9.
17. T. Yu, Y.W. Zhu, X.J. Xu, K.S. Yeong, Z.X. Shen, P. Chen, C.T. Lim, J.T.L. Thong, C.H. Sow, Small 2, 80 (2006). doi:10.1002/smll.200500234.
18. Y.W. Zhu, T. Yu, F.C. Cheong, X.J. Xu, C.T. Lim, V.B.C. Tan, J.T.L. Thong, C.H. Sow, Nanotechnology 16, 88 (2005). doi:10.1088/0957-4484/16/1/018.
19. 3).
20. I.R. Beattie, T.R. Gilson, J. Chem. Soc. A 5, 980 (1983).
21. R. Fowler, L.W. Nordheim, Proc. R. Soc. Lond. A 119, 173 (1928). doi:10.1098/rspa.1928.0091.
22. V.E. Hendrich, P.A. Cox, in Surface science of metal oxides (Cambridge University Press, Cambridge, UK, 1994).
23. Q. Zhao, J. Xu, X.Y. Xu, Z. Wang, D.P. Yang, Appl. Phys. Lett. 85, 5331 (2005). doi:10.1063/1.1825620.