Plasma-assisted modulation of morphology and composition in tin oxide nanostructures for sensing applications

Advanced Engineering Materials

Volumn 9, Issue 8, 2007, Pages 658-663

  Mathur, Sanjay ^a,b   Ganesan, Rajesh ^a   Grobelsek, Ingrid ^a   Shen, Hao ^a   Ruegamer, Thomas ^a   Barth, Sven ^a  

^a INM LEIBNIZ INSTITUTE FOR NEW MATERIALS   (Germany)

^b UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHARGE CARRIERS; CHEMICAL VAPOR DEPOSITION; ION BOMBARDMENT; MORPHOLOGY; NANOSTRUCTURED MATERIALS; SINGLE CRYSTALS;

ETHANOL SENSING PROPERTIES; NANOSTRUCTURED PLATELETS; SPUTTER REDEPOSITION MECHANISM;

TIN OXIDES;

EID: 34548337170     PISSN: 14381656     EISSN: 15272648     Source Type: Journal    
DOI: 10.1002/adem.200700086     Document Type: Article

References (28)

1. M. I. Baraton, L. Mehari, J. Nanoparticle Res. 2004, 6, 107.
2. D. Kohl, J. Phys. D 2001, 34, 125.
3. G. Tschulena, A. Lahrmann, in Sens. Appl. 5, Wiley-VCH, Weinheim 2003, 1.
4. N. Yamazoe, Sens. Actuators B 2005, 108, 2.
5. A. Kolmakov, M. Moskovits, Ann. Rev. Mater. Sci. 2004, 34, 151.
6. M. E. Franke, T. J. Koplin, U. Simon, Small 2006, 2, 36.
7. Y. Zhang, A. Kolmakov, Y. Lilach, M. Moskovits, J. Phys. Chem. B 2005, 109, 1923.
8. A. Kolmakov, Y. Zhang, G. Cheng, M. Moskovits, Adv. Mater. 2003, 15, 997.
9. Z. L. Wang, in Nanowires and Nanobelts 1, Springer, Berlin 2003.
10. X. Liu, C. Li, S. Han, J. Han, C. W. Zhou, Appl. Phys. Lett. 2003, 82, 1950.
11. W. Goepel, Sens. Actuators 1989, 16, 167.
12. Y. J. Lin, C. J. Wu, Surf. Coat. Tech. 1996, 88, 239.
13. F. M. Amanullah, K. J. Pratap, V. H. Babu, Mater. Sci. Eng. B 1998, 5, 93.
14. Z. L. Wang in Nanowires and Nanobelts. 2, Springer, Berlin 2006, 1.
15. a) S. V. Kalinin, J. Shin, S. Jesse, D. Geohegan, A. P. Baddorf, Y. Lilach, M. Moskovits, A. Kolmakov, J. Appl. Phys. 2005, 34, 125.
16. b) S. Mathur, V. Sivakov, H. Shen, S. Barth, A. Nilsson, P. Kuhn, Thin Solid Films 2006, 502, 88.
17. M. Batzill, U. Diebold, Prog. Surf. Sci. 2005, 79, 47.
18. Z. R. Dai, J. L. Gole, J. D. Stout, Z. L. Wang, J. Phys. Chem. B 2002, 106, 1274.
19. H. G. Yang, H. C. Zeng, Angew. Chem. Int. Ed. 2004, 43, 5930.
20. E. Comini, G. Fagila, G. Sberveglieri, Appl. Phys. Lett. 2002, 81, 1869.
21. H. Huang, O. K. Tan, Y. C. Lee, M. S. Tse, J. Guo, T. White, Nanotech. 2006, 17, 243.
22. S. Mathur, S. Barth, H. Shen, J. C. Pyun, U. Werner, Small 2005, 1, 713.
23. S. Mathur, H. Shen, V. Sivakov, U. Werner, Chem. Mater. 2004, 16, 2449.
24. S. Mathur, T. Ruegamer, N. Donia, H. Shen, J. Nanosci. Nanotech. 2007 (accepted).
25. R. Djulgerova, L. Popova, G. Beshkov, Z. Lju Petrovic, Z. Rakocevic, V. Mihailov, V. Gencheva, T. Dohnalik, J. Phys. D. 2006, 39, 3267.
26. M. Veith, N. Lecerf, S. Mathur, H. Shen, S. Huefner, Chem. Mater. 1999, 11, 3013.
27. Chen, X. Peng, K. Kokzur, B. Miller, Chem. Commun. 2004, 1964.
28. J. G. Yu, X. Zhao, J. Mater. Sci. Lett. 2001, 20, 671.