Influence of moisture on the CVD formation of a MnOx barrier layer

Advanced Metallization Conference (AMC)

Volumn , Issue , 2009, Pages 307-311

  Neishi, K ^a   Matsumoto, K ^b   Sato, H ^b   Itoh, H ^b   Hosaka, S ^b   Koike, J ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER LAYERS; DEPOSITION BEHAVIOR; DIFFUSION BARRIER LAYERS; MOISTURE EFFECTS; OXIDE SUBSTRATES; PREANNEALING; REACTION CHAMBERS;

ANNEALING; CHEMICAL VAPOR DEPOSITION; GASES; MANGANESE COMPOUNDS; METALLIZING; MOISTURE;

SUBSTRATES;

EID: 70349961370     PISSN: 15401766     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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