On the release of hydrogen from the S-H groups in the formation of self-assembled monolayers of thiols

Langmuir

Volumn 25, Issue 18, 2009, Pages 10435-10438

  Kankate, Laxman ^a   Turchanin, Andrey ^a   Gölzhäuser, Armin ^a  

^a BIELEFELD UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMINO GROUP; EXPERIMENTAL EVIDENCE; GOLD SURFACES; H-BONDS; NITRO GROUP; REACTION SCHEMES; SAMS; THIOL ADSORPTION; THIOL MOLECULES; VACUUM VAPOR DEPOSITION;

ADSORPTION; AMINES; DISSOCIATION; ELECTRON ENERGY LEVELS; GOLD DEPOSITS; GOLD METALLURGY; HYDROGEN; HYDROGEN BONDS; VACUUM DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

SELF ASSEMBLED MONOLAYERS;

EID: 70349895907     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la902168u     Document Type: Article

References (31)

1. Porter, M. D.; Bright, T. B.; Allara, D. L.; Chidsey, C. E. D. J. Am. Chem. Soc. 1987, 109 (12), 3559-3568.
2. Bain, C. D.; Troughton, E. B.; Tao, Y. T.; Evall, J.; Whitesides, G. M.; Nuzzo, R. G. J. Am. Chem. Soc. 1989, 111 (1), 321-335.
3. Sabatani, E.; Cohenboulakia, J.; Bruening, M.; Rubinstein, I. Langmuir 1993, 9 (11), 2974-2981.
4. Cyganik, P.; Buck, M.; Strunskus, T.; Shaporenko, A.; Wilton-Ely, J.; Zharnikov, M.; Wöll, C. J. Am. Chem. Soc. 2006, 128 (42), 13868-13878.
5. Dubois, L. H.; Nuzzo, R. G. Annu. Rev. Phys. Chem. 1992, 43, 437-463.
6. Finklea, H. O. Electrochemistry of organized monolayers of thiols and related molecules on electrods. In Electroanalytical Chemistry; Bard, A. J., Rubinstein, I., Eds.; Marcel Dekker, Inc.: New York, 1996.
7. Ulman, A. Thin Films: Self-Assembled Monolayer of Thiols; Academic Press: San Diego, CA, 1998.
8. Schreiber, F. Prog. Surf. Sci. 2000, 65 (5-8), 151-256.
9. Krämer, S.; Fuierer, R. R.; Gorman, C. B. Chem. Rev. 2003, 103 (11), 4367-4418.
10. Smith, R. K.; Lewis, P. A.; Weiss, P. S. Prog. Surf. Sci. 2004, 75 (1-2), 1-68.
11. Love, J. C.; Estroff, L. A.; Kriebel, J. K.; Nuzzo, R. G.; Whitesides, G. M. Chem. Rev. 2005, 105 (4), 1103-1169.
12. Vericat, C.; Vela, M. E.; Benitez, G. A.; Gago, J. A. M.; Torrelles, X.; Salvarezza, R. C. J. Phys.: Condens. Matter 2006, 18 (48), R867-R900.
13. Woodruff, D. P. Phys. Chem. Chem. Phys. 2008, 10, 7211-7221.
14. Kodama, C.; Hayashi, T.; Nozoye, H. Appl. Surf. Sci. 2001, 169, 264-267.
15. Gronbeck, H.; Curioni, A.; Andreoni, W. J. Am. Chem. Soc. 2000, 122 (16), 3839-3842.
16. Lustemberg, P. G.; Martiarena, M. L.; Martinez, A. E.; Busnengo, H. F. Langmuir 2008, 24 (7), 3274-3279.
17. Zhou, J. G.; Hagelberg, F. Phys. Rev. Lett. 2006, 97 (4), 045505.
18. Nuzzo, R. G.; Zegarski, B. R.; Dubois, L. H. J. Am. Chem. Soc. 1987, 109 (3), 733-740.
19. Rzezinicka I.I.; Lee, J. S.; Maksymovych, P.; Yates, J. T. J. Phys. Chem. B 2005, 109 (33), 15992-15996.
20. Hasan, M.; Bethell, D.; Brust, M. J. Am. Chem. Soc. 2002, 124 (7), 1132-1133.
21. Zharnikov, M.; Grunze, M. J. Phys.: Condens. Matter 2001, 13 (49), 11333-11365.
22. Turchanin, A.; Schnietz, M.; El-Desawy, M.; Solak, H. H.; David, C.; Gölzhäuser, A. Small 2007, 3 (12), 2114-2119.
23. Briggs, D.; Grant, J. T. Surface Analyses by Auger and X-Ray Photoelectron Spectroscopy; SurfaceSpectra Limited: Chichester. U. K., 2003.
24. Turchanin, A.; Tinazli, A.; El-Desawy, M.; Grossmann, H.; Schnietz, M.; Solak, H. H.; Tampé, R.; Gölzhäuser, A. Adv. Mater. 2008, 20 (3), 471-477.
25. Eck, W.; Stadler, V.; Geyer, W.; Zharnikov, M.; Gölzhäuser, A.; Grunze, M. Adv. Mater. 2000, 12 (11), 805-808.
26. NIST X-ray Photoelectron Spectroscopy Database 20, version 3.4 (Web Version) ; National Institute of Standards and Technology: Gaithersburg, MD, 2003.
27. Castner, D. G.; Hinds, K.; Grainger, D. W. Langmuir 1996, 12 (21), 5083-5086.
28. Corma, A.; Serna, P. Science 2006, 313 (5785), 332-334.
29. Haber, F. Z. Elektrochem. 1898, 22, 506.
30. Roodenko, K.; Gensch, M.; Rappich, J.; Hinrichs, K.; Esser, N.; Hunger, R. J. Phys. Chem. B 2007, 111 (26), 7541-7549.
31. Leung, T. Y. B.; Schwartz, P.; Scoles, G.; Schreiber, F.; Ulman, A. Surf. Sci. 2000, 458 (1-3), 34-52.