Very high temperature chemical vapor deposition of new carbon thin films using organic semiconductor molecular beam sources

Thin Solid Films

Volumn 518, Issue 2, 2009, Pages 778-780

  Noguchi, Takuya ^a   Shimada, Toshihiro ^a   Hanzawa, Akinori ^a   Hasegawa, Tetsuya ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Amorphous carbon films; Needle like grains; Perylene 3,4,9,10 tetracarboxylic acid dianhydride (PTCDA); Raman spectroscopy; Thermal chemical vapor deposition (CVD); Very high temperature chemistry; Yttrium stabilized zirconia (YSZ); Zirconium carbide films (ZrC)

Indexed keywords

NEEDLE-LIKE GRAINS; PERYLENE-3,4,9,10-TETRACARBOXYLIC ACID DIANHYDRIDE (PTCDA); THERMAL CHEMICAL VAPOR DEPOSITION (CVD); VERY HIGH TEMPERATURE CHEMISTRY; YTTRIUM-STABILIZED ZIRCONIA (YSZ); ZIRCONIUM CARBIDE FILMS (ZRC);

AMORPHOUS CARBON; AMORPHOUS FILMS; ATOMIC SPECTROSCOPY; CARBIDES; CARBON FILMS; CHEMICAL MODIFICATION; DEPOSITION; ELECTRON TRANSITIONS; FILM PREPARATION; GRAFTING (CHEMICAL); MOLECULAR BEAMS; NEEDLES; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SEMICONDUCTING ORGANIC COMPOUNDS; SUBSTRATES; SYNTHESIS (CHEMICAL); THERMOCHEMISTRY; VAPORS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; YTTRIUM; YTTRIUM ALLOYS; ZIRCONIA; ZIRCONIUM;

CHEMICAL VAPOR DEPOSITION;

EID: 70349857682     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.07.097     Document Type: Article

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