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Volumn , Issue , 2009, Pages 90-93

Research on deep RIE-based through-si-via micromachining for 3-D system-in-package integration

Author keywords

Bulk micromachining; Deep reactive ion etching (DRIE); System in package (SiP); Three dimensional integration; Through si via (TSV)

Indexed keywords

BULK MICROMACHINING; DEEP REACTIVE ION ETCHING (DRIE); SYSTEM-IN-PACKAGE (SIP); THREE DIMENSIONAL INTEGRATION; THROUGH-SI-VIA (TSV);

EID: 70349678323     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NEMS.2009.5068533     Document Type: Conference Paper
Times cited : (7)

References (6)
  • 2
    • 51849111087 scopus 로고    scopus 로고
    • O. Aharon, L.Gal, Y. Nemirovsky, Hybrid Approach for RF MEMS Devices, Proceedings of the IEEE COMCAS 2008, 2008.6, Tel-Aviv, Israel.
    • O. Aharon, L.Gal, Y. Nemirovsky, "Hybrid Approach for RF MEMS Devices", Proceedings of the IEEE COMCAS 2008, 2008.6, Tel-Aviv, Israel.
  • 3
    • 24644517630 scopus 로고    scopus 로고
    • Architectural Implications and Process Development of 3-D VLSI Z-Axis InterconnectsUsing Through Silicon Vias
    • August
    • L. Schaper, et al, "Architectural Implications and Process Development of 3-D VLSI Z-Axis InterconnectsUsing Through Silicon Vias", IEEE Transactions on Advanced Package, Vol. 28, No.3, August, 2005, pp. 355-365.
    • (2005) IEEE Transactions on Advanced Package , vol.28 , Issue.3 , pp. 355-365
    • Schaper, L.1
  • 4
    • 3142734901 scopus 로고    scopus 로고
    • The simulation of the Bosch process with string-cell hybrid Method
    • Zhou R., Zhang H., Hao Y. and Wang Y., "The simulation of the Bosch process with string-cell hybrid Method", Journal of Micromechanics and Microengineering, volume 14, issue 7 (2004), pages 851 - 858.
    • (2004) Journal of Micromechanics and Microengineering , vol.14 , Issue.7 , pp. 851-858
    • Zhou, R.1    Zhang, H.2    Hao, Y.3    Wang, Y.4
  • 5
    • 0037683086 scopus 로고    scopus 로고
    • Challenges, developments and applications of silicon deep reactive ion etching
    • Robert Bosch Gmbh
    • Robert Bosch Gmbh, "Challenges, developments and applications of silicon deep reactive ion etching", Microelectronic Engineering, Vol: 67 - 68 (2003), pp. 349 - 355
    • (2003) Microelectronic Engineering , vol.67 - 68 , pp. 349-355
  • 6
    • 52449083004 scopus 로고    scopus 로고
    • The modelling, simulation and experimental verification of high aspect ratio silicon etching process techniques
    • Ph.D dissertation, Peking University, China
    • Zhou R., "The modelling, simulation and experimental verification of high aspect ratio silicon etching process techniques", Ph.D dissertation, Peking University, China, 2005.
    • (2005)
    • Zhou, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.