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Surface Engineering

Volumn 25, Issue 8, 2009, Pages 570-576

Influence of CH3SO3H and AlCl3 in direct and pulse current electrodeposition of trivalent chromium

(3) Mohan, S a Vijayakumar, J a Saravanan, G a

a CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE (India)

Author keywords

Chromium; Coatings; Off time; On time; Pulse electrodeposition

Indexed keywords

COMPLEXING AGENTS; CORROSION STUDIES; CURRENT EFFICIENCY; OFF TIME; ON TIME; OVERPOTENTIAL; POLARISATION; POTENTIODYNAMICS; PULSE CURRENT ELECTRODEPOSITION; PULSE ELECTRODEPOSITION; SEM; TRIVALENT CHROMIUM;

CHROMIUM; COATINGS; CORROSION RESISTANCE; DEPOSITS; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; HYDROGEN; ORGANIC ACIDS; SCANNING ELECTRON MICROSCOPY; UREA;

ELECTRODEPOSITION;

EID: 70349283723 PISSN: 02670844 EISSN: 17432944 Source Type: Journal
DOI: 10.1179/026708409X364957 Document Type: Article

Times cited : (18)

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