Thermoluminescence assessment of 0.5, 1.0 and 4.0 μm thick HFCVD undoped diamond films

Physica Status Solidi (A) Applications and Materials Science

Volumn 206, Issue 9, 2009, Pages 2103-2108

  Melendrez R ^a   Chernov, V ^a   May, P W ^b   Castaneda B ^a   Pedroza Montero, M ^a   Barboza Flores, M ^a  

^a UNIVERSIDAD DE SONORA   (Mexico)

^b UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BEST FIT; CHEMICAL VAPOR DEPOSITION DIAMOND; GROWING CONDITIONS; GROWING PROCESS; HFCVD DIAMOND; HIGH QUALITY; HIGH TEMPERATURE; KINETICS PARAMETER; LOW TEMPERATURES; SECOND ORDER KINETICS; SI (100) SUBSTRATE; THICK SAMPLES; TISSUE-EQUIVALENCE PROPERTIES; TL GLOW CURVE;

CHEMICAL VAPOR DEPOSITION; CURVE FITTING; DIAMOND CUTTING TOOLS; DIAMOND FILMS; DIAMONDS; FILM GROWTH; LIGHT EMISSION; MEDICAL APPLICATIONS;

THERMOLUMINESCENCE;

EID: 70349094878     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200982214     Document Type: Article

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