Thermoluminescence characterization of a MWCVD diamond film exposed to β-rays and UV radiation

Physica Status Solidi (A) Applications and Materials Science

Volumn 202, Issue 11, 2005, Pages 2206-2211

  Preciado FIores, S ^a   Schreck, M ^b   Melendrez R ^a   Chernov, V ^a   Bernal, R ^a   Cruz Vazquez C ^a   Brown, F ^a   Barboza Flores, M ^a  

^a UNIVERSIDAD DE SONORA   (Mexico)

^b UNIVERSITY OF AUGSBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM IRRADIANCE; ELECTROMAGNETIC SPECTRUM; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITED (MWCVD); SILICON SUBSTRATES;

CHEMICAL VAPOR DEPOSITION; ELECTROMAGNETIC WAVES; FILM GROWTH; MICROWAVES; THERMOLUMINESCENCE; ULTRAVIOLET RADIATION;

DIAMOND FILMS;

EID: 33746441125     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200561901     Document Type: Conference Paper

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