Low atomic number coating for XEUS silicon Pore Optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7011, Issue , 2008, Pages

  Lumb, D H ^a   Jensen, C P ^b   Krumrey, M ^c   Cibik, L ^c   Christensen, F ^b   Collon, M ^d   Bavdaz, M ^a  

^a EUROPEAN SPACE AGENCY   (Netherlands)

^b TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^c PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^d Cosine Research ^*  (Netherlands)

Author keywords

Multi layer characterization; Optics; X ray astronomy; X ray telescopes

Indexed keywords

ATOMIC NUMBERS; COATING DESIGNS; EFFECTIVE AREA; FIXED ANGLES; LOW ENERGIES; MATERIAL CHOICE; MULTI-LAYER CHARACTERIZATION; PORE OPTICS; REFLECTANCE MEASUREMENTS; SILICON SUBSTRATES; X-RAY ASTRONOMY; X-RAY TELESCOPES;

ASTRONOMICAL SATELLITES; ASTROPHYSICS; ATOMS; COATINGS; ELECTROMAGNETIC WAVES; INSTRUMENTS; MEASUREMENTS; OPTICAL TELESCOPES; REFLECTION; SPACE TELESCOPES; SPACECRAFT EQUIPMENT; SPACECRAFT OBSERVATORIES; X RAY CAMERAS; X RAY OPTICS; X RAYS;

GAMMA RAYS;

EID: 70249140307     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.789664     Document Type: Conference Paper

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