The effect of ambient pressure on laser-induced silicon plasma temperature, density and morphology

Journal of Physics D: Applied Physics

Volumn 42, Issue 16, 2009, Pages

  Cowpe, J S ^a   Pilkington, R D ^a   Astin, J S ^a   Hill, A E ^a  

^a UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT PRESSURES; ELECTRON DENSITIES; EMISSION LINES; EXCITATION TEMPERATURE; LASER ABLATION PLUME; LASER INDUCED; LASER INDUCED BREAKDOWN SPECTROSCOPY; LASER INDUCED PLASMA; LASER PLUMES; LOCAL THERMAL EQUILIBRIUM; LOW PRESSURES; ND: YAG; PLASMA EVOLUTION; PLASMA TEMPERATURE; PULSED FREQUENCY; STARK BROADENINGS; TEMPORAL EVOLUTION;

ELECTROMAGNETIC WAVE EMISSION; LASER ABLATION; LASER PRODUCED PLASMAS; LASER SPECTROSCOPY; LASERS; MORPHOLOGY; NEODYMIUM LASERS; PLASMA DIAGNOSTICS; PRESSURE EFFECTS;

PULSED LASER APPLICATIONS;

EID: 70249129425     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/16/165202     Document Type: Article

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