The application of disturbance response decoupling to the vibration control of an electron beam lithography system

Japanese Journal of Applied Physics

Volumn 48, Issue 6 PART 2, 2009, Pages

  Wang, Fu Cheng ^a   Tsao, Yu Chia ^a   Yen, Jia Yush ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE COMPONENTS; CONTROL METHODS; CONTROL STRATEGIES; CONTROL STRUCTURE; EBL SYSTEMS; LITHOGRAPHY TOOLS; LOAD DISTURBANCES; PASSIVE ISOLATORS; PERFORMANCE CRITERION; PERFORMANCE REQUIREMENTS; RESOLUTION REQUIREMENTS;

AUTOMOBILE PARTS AND EQUIPMENT; ELECTRON BEAMS; VEHICLE SUSPENSIONS; VIBRATION CONTROL;

ELECTRON BEAM LITHOGRAPHY;

EID: 70249101379     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.06FB04     Document Type: Article

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