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Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

RF magnetron sputtering of poly(propylene) in a mixture of argon and nitrogen

(5) Hanus, Jan a Kousal, Jaroslav a Choukourov, Andrei a Biederman, Hynek a Slavinska, Danka a

a CHARLES UNIVERSITY (Czech Republic)

Author keywords

Magnetron; Plasma polymerization; Poly(propylene) (PP); Sputtering; Thin films

Indexed keywords

DEPOSITION PROCESS; FTIR MEASUREMENTS; NITROGEN CONTENT; PLANAR MAGNETRON; PLASMA POLYMER FILMS; POLY(PROPYLENE) (PP); RF-MAGNETRON SPUTTERING; RF-POWER; WORKING GAS; XPS;

ARGON; CONTACT ANGLE; DEPOSITION RATES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS MIXTURES; MAGNETRON SPUTTERING; MAGNETRONS; MIXTURES; NITROGEN; OXYGEN; PLASMA DEPOSITION; PLASMA POLYMERIZATION; PLASMAS; PLASTIC FILMS; POLYMERS; PROPYLENE; PUMPING PLANTS; THIN FILMS;

POLYMER FILMS;

EID: 70049091336 PISSN: 16128850 EISSN: 16128869 Source Type: Journal
DOI: 10.1002/ppap.200731910 Document Type: Conference Paper

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.