Exploring new metrology for complex photomask patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Higuchi, Masaru ^a   Aihara, Tatsuya ^a   Saito, Hideaki ^a   Yonekura, Isao ^a   Suzuki, Jotaro ^a   Gallagher, Emily ^b   Stobert, Ian P ^b  

^a TOPPAN PRINTING CO LTD   (Japan)

^b IBM   (United States)

Author keywords

CD metrology; Center of gravity; Image placement; OPC; Photomask metrology

Indexed keywords

CD METROLOGY; CENTER OF GRAVITY; IMAGE PLACEMENT; OPC; PHOTOMASK METROLOGY;

GRAVITATIONAL EFFECTS; MASKS; MEASUREMENTS; PHOTOMASKS;

DATA STORAGE EQUIPMENT;

EID: 62649139522     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801994     Document Type: Conference Paper

References (4)

1. Higuchi, M., Gallagher, E., Ceperley, D., Brunner, T., Bowley, R., and. McGuire, A., "Revisiting Mask Contact Hole Measurements" Proc. SP1E, 6349-158. (2006).
2. Aihara, T., Kondo, S., and Higuchi, M., "Reliable measurement method for complicated OPC pattern" Proc. SPIE, 7028-58. (2008).
3. Yonekura, I., Fukushima, Y., Matsuo, F., Otaki, M., Fukugami, N., "Pattern Shape Analysis Tool for Quantitative Estimate of Photomask and Process", Proc. SPIE, 4409-40 (2001).
4. Gallagher, E., Stobert, I., Higuchi, M., and Samuels, D., "Exploring the Sources of MEEF in Contact SRAMs" Proc. SPIE, 6730-87. (2007).