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Volumn 54, Issue 27, 2009, Pages 6963-6970

Impedance of passive oxide films with graded thickness: Influence of the electrode and cell geometry

Author keywords

Current distribution; EIS; FEM calculation; Niobium; Tantalum

Indexed keywords

ANALYTICAL CALCULATION; CELL GEOMETRIES; CURRENT DISTRIBUTION; CYLINDRICAL ELECTRODES; EIS; ELECTRODE SURFACES; ELECTROLYTE RESISTANCE; FEM CALCULATION; FINITE ELEMENT CALCULATIONS; FREQUENCY DISPERSION; INHOMOGENEOUS DISTRIBUTION; LAPLACE'S EQUATIONS; PASSIVE FILMS; PASSIVE OXIDE FILMS; PRIMARY CURRENTS; SIMPLIFYING ASSUMPTIONS;

EID: 69949163730     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.07.004     Document Type: Article
Times cited : (18)

References (12)
  • 6
    • 2342467989 scopus 로고
    • Yeager E., Bockris J.OM., Coway B.E., and Sarangapani S. (Eds), Plenum Press, New York
    • Ibl N. In: Yeager E., Bockris J.OM., Coway B.E., and Sarangapani S. (Eds). Comprehensive Treatise of Electrochemistry 6 (1993), Plenum Press, New York 1
    • (1993) Comprehensive Treatise of Electrochemistry , vol.6 , pp. 1
    • Ibl, N.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.