Characterization of structure and distortion in the manganese ions implanted TiO2 thin films

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 267, Issue 18, 2009, Pages 3109-3113

  Ding, Peng ^a   Liu, Fa Min ^a   Yang, Xin An ^b   Li, Jian Qi ^b  

^a BEIHANG UNIVERSITY   (China)

^b INSTITUTE OF PHYSICS   (China)

Author keywords

Edge dislocations; Magnetron sputtering; Manganese ions implanted TiO2 thin films; Structure distortion; TEM

Indexed keywords

ANATASE STRUCTURES; ANNEALING TEMPERATURES; CHARACTERIZATION OF STRUCTURE; CONCENTRATION OF; DIRECT CURRENT MAGNETRON SPUTTERING; EDGE DISLOCATION; EDGE DISLOCATIONS; GLASS SUBSTRATES; GRAIN SIZE; HRTEM IMAGES; MANGANESE IONS; MANGANESE IONS IMPLANTED TIO2 THIN FILMS; SEM IMAGE; STRUCTURE DISTORTION; TEM; TIO; XRD;

ANNEALING; COMPOSITE FILMS; IONS; MAGNETRONS; MANGANESE COMPOUNDS; THIN FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES;

MANGANESE;

EID: 69949125223     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2009.06.031     Document Type: Article

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