Synthesis of a photo-patternable cross-linked epoxy system containing photodegradable carbonate units for deep UV lithography

Journal of Applied Polymer Science

Volumn 114, Issue 4, 2009, Pages 2093-2100

  Huh, Geun ^a,b   Kwon, Ki Ok ^a   Cha, Sang Ho ^a   Yoon, Sang Woong ^c   Lee, Moo Young ^b   Lee, Jong Chan ^a  

^a Seoul National University   (South Korea)

^b Cheil Industries Display Material Research Institute   (South Korea)

^c SAMSUNG Electronics   (South Korea)

Author keywords

Carbonate; Cross linking; Degradation; Oxirane; Photoresist

Indexed keywords

BOTTOM ANTIREFLECTIVE COATING; CARBONATE GROUP; CARBONATE UNITS; CROSS-LINKED FILMS; DEEP UV; DEEP-UV LITHOGRAPHY; EPOXY FILMS; EPOXY SYSTEMS; METHACRYLIC ACIDS; MONOMERIC UNITS; OXIRANE; OXIRANES; REFLECTIVE INDEX;

CARBOXYLIC ACIDS; DEGRADATION; ORGANIC ACIDS; PHOTODEGRADATION; PHOTORESISTORS; STYRENE; SURFACE TREATMENT; SYNTHESIS (CHEMICAL);

CARBONATION;

ABSORBENCY; COATING; CROSS LINKING; PHOTOCHEMICAL DEGRADATION; POLYSTYRENE; REFLECTIVE PROPERTY; SYNTHESIS; ULTRAVIOLET RADIATION;

EID: 69949096749     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.29870     Document Type: Article

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