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Volumn 484, Issue 1-2, 2009, Pages 28-32
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Fabrication of nanoporous gold thin films on silicon substrate by multilayer deposition of Au and Ag
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Author keywords
Electrolytic dealloying; Heat treatment; Nanoporous gold; Physical vapor deposition; Thin films
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Indexed keywords
AG FILMS;
AG-ALLOY;
CHEMICAL COMPOSITIONS;
DEALLOYING;
DISSOLUTION RATES;
ELEVATED TEMPERATURE;
MULTILAYER DEPOSITIONS;
NANOPOROUS GOLD;
SI SUBSTRATES;
SILICON SUBSTRATES;
DEPOSITION;
DISSOLUTION;
FABRICATION;
FILM PREPARATION;
GOLD COATINGS;
GOLD DEPOSITS;
METALLIC FILMS;
MULTILAYER FILMS;
MULTILAYERS;
PHYSICAL VAPOR DEPOSITION;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON ALLOYS;
SILVER;
SILVER ALLOYS;
SUBSTRATES;
GOLD;
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EID: 69949085784
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2009.05.067 Document Type: Letter |
Times cited : (15)
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References (18)
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